منابع مشابه
Recent Topics in CMP-Related IC Design for Manufacturing
CMP is a planarization technique for multilevel VLSI metallization processes. CMP fills are inserted as a design for manufacturability (DFM) methodology to improve pattern-dependent post-CMP topography, i.e., to improve interconnect planarity. Design-driven fill synthesis seeks to optimize CMP fill with respect to objectives beyond mere density uniformity. Design-driven fill synthesis minimizes...
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NMR and NMR imaging (MRI) are finding increasing use not only in the clinical and medical fields, but also in material, physicochemical, biological, geological, industrial and environmental applications. This short review is limited to two topics: (i) new techniques and pulse sequences and their application to non-clinical fields that may have clinical application; and (ii) new trends in MR con...
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This paper summarizes recent research at the author’s laboratory into power management circuitry, including: (1) Envelope-tracking power supplies for base station power amplifiers, (2) Digital PWM generator circuitry, (3) Spreadspectrum clocking for EMI reduction in digitally-controlled power supplies, (4) High-efficiency coupled-inductor DC-DC converters with fast response and low ripple, and ...
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ژورنال
عنوان ژورنال: TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C
سال: 1995
ISSN: 0387-5024,1884-8354
DOI: 10.1299/kikaic.61.2653